:orphan:

.. ****************************************************************************
.. CUI
..
.. The Advanced Framework for Simulation, Integration, and Modeling (AFSIM)
..
.. The use, dissemination or disclosure of data in this file is subject to
.. limitation or restriction. See accompanying README and LICENSE for details.
.. ****************************************************************************

masking_pattern
---------------

.. command:: masking_pattern
   :block:

.. parsed-literal::

   masking_pattern *<pattern-name_>*
      state_ *<state-name>* | default
         platform_factor_
            ... :ref:`Azimuth-elevation_Table_Definition` ...
         part_factor_
            ... :ref:`Azimuth-elevation_Table_Definition` ...
      state_ ...
   end_masking_pattern

Overview
========


:command:`masking_pattern` defines a *masking pattern* for :command:`comm` or :command:`sensor`) systems (i.e., those things
that are based on :command:`articulated parts <_.articulated_part>`. A masking pattern is used to model the effects of
structural obscuration. The masking pattern consists of one or more collections of azimuth/elevation tables where each
collection defines the masking pattern that applies when the system is in a particular 'state'.  A 'state' represents a
condition such as 'bay-doors-open.'

The collection for a given state consists of either or both of a platform-relative table  platform_factor_ and a
part-relative table part_factor_. Each table is an azimuth/elevation table where the dependent value is a number
in the range [0 .. 1]. The value represents the fraction of the signal that is passed. Typical values are 1 (no
blockage) or 0 (complete blockage), but intermediate values may be used to represent angle-dependent reduction. If a
table has both a platform_factor and a part_factor then the resulting fraction passed is the product of the two values.

Masking patterns are available for all of the core WSF sensors and communications devices.

Commands
========

.. command:: pattern-name
   
   The name to be given to the pattern. This is the name that is referenced by the :command:`_.articulated_part.masking_pattern` 
   on a :command:`comm` or :command:`sensor` device. A pattern may be redefined, with the last occurrence being
   used.

.. command:: state  [ <state-name> | default ]
   
   Indicates that the following table definition(s) will be used when the articulated is in the state *<state-name>*.  If 
   **default** is specified then the subsequent table will be used if the articulated part is in a state that does not
   match any of the states defined in the signature.
   
   If a **state** command is not specified, then the pattern has one table that applies to all states.
   
   There are script commands in :class:`WsfArticulatedPart` that allow the application to query
   (:method:`WsfArticulatedPart.MaskingPatternState`) or modify (:method:`WsfArticulatedPart.SetMaskingPatternState`) the
   masking pattern state.

.. command:: platform_factor
   
   Indicates the following table defines a platform-relative masking pattern. The azimuth and elevation angles in the
   table are relative to the platform.

.. command:: part_factor
   
   Indicates the following table defines a part-relative masking pattern. The azimuth and elevation angles in the table a
   relative to the part.
   
   Part-relative tables are generally used when a turret-mounted system is employed and there is blocking structure
   attached to the turret.

Example
=======

The following table blocks everything from 20-30 degrees and 110-120 degrees out the right side.

::

 masking_pattern TEST_SENSOR_MASKING
    platform_factor
       inline_table none 10 2
                   -90.0 90.0
          -180.00    1.0  1.0
            19.99    1.0  1.0
            20.00    0.0  0.0
            30.00    0.0  0.0
            30.01    1.0  1.0
           109.99    1.0  1.0
           110.00    0.0  0.0
           120.00    0.0  0.0
           120.01    1.0  1.0
           180.00    1.0  1.0
         end_inline_table
 end_masking pattern

 sensor TEST_SENSOR ...
    ...
    masking_pattern TEST_SENSOR_MASKING
    ...
 end_sensor